Equipment for rapid heat treatment, thermal oxidation treatment, and high-temperature annealing
A rapid annealing furnace uses halogen infrared lamps as a heat source to rapidly heat wafers or materials to 300 ℃ -1200 ℃ at an extremely fast heating rate, thereby eliminating some defects inside the wafers or materials and improving product performance.
The rapid annealing furnace adopts an advanced microcomputer control system and PID closed-loop temperature control, which can achieve extremely high temperature control accuracy and uniformity. It can also be configured with a vacuum chamber and multiple gas channels according to user process requirements.