The P5000 platform is an AMAT multi chamber equipment platform that can install 4 chambers. The etching chambers include Mark II, MxP, MxP+, Super-E, etc. It can be used for etching silicon oxide, silicon nitride, polycrystalline silicon, silicon, and metal materials. CVD chambers can be used for chemical vapor deposition of materials such as silicon oxide, silicon nitride, and tungsten metal. The P5000 platform equipment has a small footprint and high space utilization rate, making it suitable for large-scale production. At the same time, the equipment is equipped with powerful RF and pneumatic systems, which can achieve compatible development of multiple processes. P5000 series equipment can be equipped with electrostatic adsorption, and suitable configurations can be selected according to different process requirements; The equipment market has a large inventory and complete spare parts channels.